The Importance of DC Self-Bias Voltage in Plasma Applications
In reactive ion etching (RIE) plasma processes, the parameter known as DC self-bias voltage is an important “control knob” for the ion ...
Posted by Janine Powell on
In reactive ion etching (RIE) plasma processes, the parameter known as DC self-bias voltage is an important “control knob” for the ion ...
Posted by Janine Powell on
Thank you for visiting us at SEMICON West 2015 in San Francisco. It was a complete success! Almost 30,000 people from all over the world ...
Posted by Katie Finney on
Physical Plasma Physical Plasma Cleaning is a technology that uses Argon ions to interact physically with matter. In an SCI Automation ...
Posted by Katie Finney on
In today’s busy world, figuring out how to maximize the hours in each day and save time have become high priorities. For instance, nobody ...
Posted by Janine Powell on
Cleaning, Surface Modification, and Etching Process Plasma cleaning is defined as a process that uses an ionized gas to interact with a ...
Posted by Janine Powell on
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